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Photolithographic Chemical

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Photoresist suppliers generally use 0.1~0.2μm membranes to filter their products. They generally use multi-stage pleated filters with nylon or polytetrafluoroethylene membrane filter cartridge. Other filter structural materials (support, core, sleeve, head) are usually polypropylene.

Polishing Liquid

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Microfiltration is mainly used in polishing liquid filtration to remove particulate pollutants, agglomerates and undispersed abrasives in the liquid, ensuring the uniformity and stability of the polishing liquid, thereby improving the quality and yield of the polishing surface.

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Microporous Membranes

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